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2023³â ¹ÝµµÃ¼ºÐ°ú ¿öÅ©¼ó °³ÃÖ ¾È³»
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  • ÀϽÃ: 2023³â 8¿ù 31ÀÏ (¸ñ¿äÀÏ) 14:00 ~ 17:30
  • Àå¼Ò: ÇѾç´ëÇб³ ¼­¿ïÄ·ÆÛ½º Á¤¸ù±¸ ¹Ì·¡ÀÚµ¿Â÷ ¿¬±¸¼¾ÅÍ 1Ãþ ÄÁÆÛ·±½ºÈ¦ 105È£
  • ÁÖÃÖ: (»ç)´ëÇѱݼӷÀç·áÇÐȸ ¹ÝµµÃ¼ºÐ°ú / ÇѾç´ëÇб³ »ê¾÷¼ÒÀç±â¼ú¿¬±¸¼Ò
  • ÁÖ°ü: (»ç)´ëÇѱݼӷÀç·áÇÐȸ
  • Âü°¡ºñ: ÀÏ¹Ý - 200,000¿ø, Çлý - 50,000¿ø (Âü°¡ µî·Ï ÈÄ Âü¼® °¡´É) 
  • Âü°¡ »çÀüµî·Ï: <ȸ¿ø »çÀüµî·Ï ¹Ù·Î°¡±â>  /  <ºñȸ¿ø »çÀüµî·Ï ¹Ù·Î°¡±â>
    - µî·Ï ±â°£: 7¿ù 19ÀÏ(È­)~8¿ù 11ÀÏ(±Ý)
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    - »çÀüµî·Ï ±â°£ ³» ³³ºÎ È®ÀÎÀÌ ¾ÈµÉ ½Ã ½Åû ³»¿ªÀº »èÁ¦µË´Ï´Ù. (ÀÏ¹Ý Âü°¡ÀÚ)
    - ÇöÀåµî·ÏÀÇ ¹ø°Å·Î¿òÀ» ÇÇÇϱâ À§Çؼ­ »çÀüµî·ÏÀ» ±Ç°í µå¸®¿À´Ï ÇùÁ¶ ºÎŹ µå¸³´Ï´Ù.
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14:00 - 14:10
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Opening Remark & ¹ÝµµÃ¼ºÐ°ú ¼Ò°³
14:10 - 14:50
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ÀÌÁ¾ÁýÀû ÆÐÅ°Áö¿¡¼­ Àç¹è¼± ¹× ÇÏÀ̺긮µå º»µù ±â¼ú À̽´
14:50 - 15:30±è¼öÇö
(UNIST)
Advanced Interconnects Technologies Using Atomic Layer Deposition (ALD) and Area-Selective ALD
15:30 - 15:50Coffee Break
15:50 - 16:30ÀÌ»ó¿î
(¾ÆÁÖ´ë)
Metal Thin Films for Advanced Interconnect Applications
16:30 - 17:10¿¬ÇÑ¿ï
(GIST)
SMART Metallization for Precision Control of Mass and Heat Transport in Advanced Integrated Circuits
17:10 - 17:20Discussion Session (¹ÝµµÃ¼ºÐ°ú ¹ßÀü ¹æÇâ Åä·Ð)
17:20 - 17:30Closing Remark -  ÃÖâȯ ¹ÝµµÃ¼ºÐ°ú À§¿øÀå
17:30 -    ¼®½Ä


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  • ¹®ÀÇó:
    -Âü°¡µî·Ï ¹× ÇàÁ¤ ÀϹÝ: ´ëÇѱݼÓÀç·áÇÐȸ »ç¹«±¹ ±èÁøÁÖ »ç¿ø (eml@kim.or.kr)
    -°­Á³»¿ë ¹× Çà»ç ÇÁ·Î±×·¥ ÀϹÝ: ¹ÝµµÃ¼ºÐ°ú Ãѹ«°£»ç À̱⿵ (kiyoung.lee@hongik.ac.kr)